(Table content can be dragged left and right)
| Specification | Content |
|---|
| Tool Name | ASTRON (Single Wafer Cleaner) |
|---|
| Model | SWC3008 | SWC3012 | SWC3016 |
|---|
| No. of Chamber | 8 | 12 | 16 |
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| Max. Throughput (wf/hr) | 480 | User Spec. | User Spec. |
|---|
| Dimension (mm) | Width | 2,230 | 2,300 | 2,300 |
|---|
| Length | 2,165 | 2,760 | 2,760 |
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| Height | 3,150 | 2,450 | 3,150 |
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| Usage | Cleaning & Etching |
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| Wafer Size | 300mm (200mm Option) |
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| No. of Loadport | 3 or 4 |
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| FA | OHT, AGV |
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| Chemical | Acid, Alkali, IPA, Hot DIW, DIW |
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| Robots | 2 for EFEM & Main (MTR) |
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| Chemical Injection | Front & Backside together |
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| Dry | IPA liquid + N2 |
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| Options | Megasonic, Nanospray |
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| Uniformity | 5% |
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